ACM Research, a two-year-old Californian company, says it can see the end of the road for chemical mechanical polishing (CMP), and is looking to move in on the market with a non-contact process. It ...

SAN JOSE — KLA-Tencor Corp. here rolled out what the company says is the industry's first production-worthy, in-situ film thickness and end-point control system for copper metal polishing in chemical ...

SANTA CLARA, Calif.--(BUSINESS WIRE)--June 25, 2003--Applied Materials, Inc. (Nasdaq:AMAT) announces Reflexion(R) LK, the industry's only low down force, high throughput CMP (chemical mechanical ...

TAIPEI, Taiwan--(BUSINESS WIRE)--Dow Electronic Materials today introduced the OPTIVISION TM 4540 CMP Polishing Pad designed to deliver low defectivity and low cost of ownership (CoO) over pad ...

Addressing Thin Film Thickness Metrology Challenges Of 14nm BEOL LayersThis paper describes a method to effectively monitor the film stack at different metal CMP process steps using a spectroscopic ...

You are able to gift 5 more articles this month. Anyone can access the link you share with no account required. Learn more. FAIRFIELD— Fairfield police are investigating the theft of about $3,000 ...

Chemical Mechanical Planarization (CMP) is a critical process in the semiconductor, LED wafer, and hard disk manufacturing industry and is used to achieve the substrate wafer's required planarity.

Chemical Mechanical Planarization is a semiconductor manufacturing process that uses slurries consisting of abrasive particles and ancillary chemicals to clean and condition semiconductor wafers ...

Best offers Cat6 Plenum 1000ft Ethernet Cable - CMP Rated, 550MHz Fluke Pass, Pure Copper, Blue Cat 6 Cable 1000ft ...

Electromigration and resistivity present serious obstacles to interconnect scaling, as previously discussed. In a copper damascene process, grain growth is constrained by the narrow trenches into ...